Synopsys Sentaurus TCAD G-2012.06 SP2 with Applications Libr

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Synopsys Sentaurus TCAD G-2012.06 SP2 with Applications Libr
  • 软件作者: 网络搜集
  • 软件大小: 5 GB
  • 下载次数: | 所属栏目: 机电一体
  • 软件语言: 简体中文
  • 需要金币: 90 金币 金币充值金币
  • 软件评级: ★★★★★
  • 更新时间: 2015-10-13
  • 软件授权: 破解软件
  • 插件情况:
  • 运行环境: WinXP,Win7,Win8
Synopsys Sentaurus TCAD软件不再提供下载地址


Synopsys Sentaurus TCAD G-2012.06 SP2内置了应用库,提供了一全套的产品套件,包括业界领先的工艺和器件仿真工具,以及一个功能强大的图形用户界面驱动的仿真环境,用于管理模拟任务和分析模拟结果。TCAD工艺和设备工具支持广泛的应用,例如CMOS、电源、存储器、图像传感器、太阳能电池、以及模拟/RF器件等。此外,Synopsys Sentaurus TCAD G-2012.06 SP2提供了互连建模和提取的工具,提供关键的寄生信息优化芯片性能。
 
Synopsys TCAD软件从根本上解决了物理偏微分方程,比如扩散和传输方程、模型的结构特性和半导体器件的电气性能等方面的问题。这种深层次的物理方法给予了TCAD准确性仿真预测的广泛的技术。因此TCAD仿真被用于开发和表征新的半导体器件或技术时,可以降低昂贵和耗时的测试晶片线路。

Synopsys Sentaurus TCAD G-2012.06 SP2


 
Synopsys TCAD offers a comprehensive suite of products that includes industry leading process and device simulation tools, as well as a powerful GUI-driven simulation environment for managing simulation tasks and analyzing simulation results. The TCAD process and device simulation tools support a broad range of applications such as CMOS, power, memory, image sensors, solar cells, and analog/RF devices. In addition, Synopsys TCAD provides tools for interconnect modeling and extraction, providing critical parasitic information for optimizing chip performance.
 
Synopsys TCAD software solves fundamental, physical partial differential equations, such as diffusion and transport equations, to model the structural properties and electrical behavior of semiconductor devices. This deep physical approach gives TCAD simulation predictive accuracy for a broad range of technologies. Therefore, TCAD simulations are used to reduce the costly and time-consuming test wafer runs when developing and characterizing a new semiconductor device or technology.
 
Synopsys TCAD tools are used by all leading semiconductor companies throughout the technology development cycle. At the early stage of technology development, TCAD tools allow engineers to explore product design alternatives such as engineering the substrate to enhance channel mobility and meet performance goals even when experimental data is not readily available. During the process integration stage, Synopsys TCAD tools enable engineers to do simulation split runs such as Design of Experiment (DOE) to comprehensively characterize and optimize the process, which saves time and money by reducing experimental runs on real wafers. As the process is introduced into manufacturing, TCAD tools provide a mechanism for advanced process control during mass production, thereby improving parametric yield.
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